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Proceedings Paper

Linear Correction Of The Influence Of Thickness Errors During The Evaporation Process
Author(s): C. J. van der Laan; H. J. Frankena
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Paper Abstract

During the production of dielectric thin film stacks for optical use, small thickness errors are unavoidable. These can be detrimental for the reflectance curve R as a function of the wavelength λ. If the thickness error for a certain layer is known, however, its influence on the reflectance can be reduced by correcting the thicknesses of the following layers. Starting from the matrix of derivatives ∂Rj/∂tk, where Rj is the reflectance of the j-th extremum and tk the thickness of the k-th layer, a method is developed which calculates these corrections during the production process of the stack. Examples will be given, using a quartz crystal monitoring system by which an error is easy detectable. Using this method, the deviations in the reflectance curve can be reduced by a factor of about five. This resulting reduction is strongly dependent on the error in the last layer of the stack for which no compensation is possible.

Paper Details

Date Published: 28 November 1983
PDF: 10 pages
Proc. SPIE 0401, Thin Film Technologies I, (28 November 1983); doi: 10.1117/12.935510
Show Author Affiliations
C. J. van der Laan, Delft University of Technology (The Netherlands)
H. J. Frankena, Delft University of Technology (The Netherlands)

Published in SPIE Proceedings Vol. 0401:
Thin Film Technologies I
J. Roland Jacobsson, Editor(s)

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