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Proceedings Paper

Production Of An Arbitrary Chromatic Spectrum By A Spatial Filtering Method: Applications To Solar Simulation And To Optical Data Processing
Author(s): A. Lacourt; Y. Torres
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Paper Abstract

The basic set-up consists in a Xenon short arc source illuminating a double monochromator. The Xenon arc spectrum is displayed into a rectangular area in the output plane of the first monochromator by sphero-cylindrical optics. In this plane a mask is inserted. Its shape is computed from data about power spectra of both the Xenon source and the desired final light beam. The mask spatially selects the proportion of each input spectral component wich must be transmitted to obtain the final spectral distribution. Then, the second monochromator (symmetrical to the first), reconstructs a parallel light beam. Finally, any power spectrum can be produced in that way. Two applications are presented here. First, a precise solar simulator is proposed. The mask is drawn after photographic recording and microdensitometric analysis of both sun and Xenon lamp power spectra. The spectral densities are converted into spectral irradiance functions, whose ratio gives the shape of the mask. According to this method we can generate the solar power spectrum from that of a Xenon lamp, with a spectral resolvance of less than a few nm. The second application deals with optical data processing. A previous work showed that in order to increase the amount of optical information extracted from Latin inscriptions, the illuminating power spectrum must be optimized. We show that it can be carried out with such a system.

Paper Details

Date Published: 26 October 1983
PDF: 5 pages
Proc. SPIE 0397, Applications of Digital Image Processing V, (26 October 1983); doi: 10.1117/12.935300
Show Author Affiliations
A. Lacourt, Laboratoire de Physique Generale et Optique (France)
Y. Torres, Laboratoire de Physique Generale et Optique (France)

Published in SPIE Proceedings Vol. 0397:
Applications of Digital Image Processing V
Andre J. Oosterlinck; Andrew G. Tescher, Editor(s)

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