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Proceedings Paper

Automated Chrome Blank Inspection: An Investigation Of Raw Plate Defects And Finished Photomask Quality
Author(s): Dale E. Ewbank; Scott M. Ashkenaz
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Paper Abstract

Defect types for chrome photomask blanks are defined. Their probable causes and effects on device yield are explained. Three systems are presented which can detect pinholes, surface defects, or both. Repeatability and detection probability of pinholes and surface defects are demonstrated for the Coberly Plate Inspector 714, which inspects for both types simultaneously. Raw material quality, in defects or pinholes per unit area, is correlated to finished photomask quality as defined by KLA-101 inspection. Through raw material inspection it is possible to predict and improve mask quality and yield.

Paper Details

Date Published: 7 November 1983
PDF: 9 pages
Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983); doi: 10.1117/12.935141
Show Author Affiliations
Dale E. Ewbank, American Microsystems, Inc. (United States)
Scott M. Ashkenaz, American Microsystems, Inc. (United States)

Published in SPIE Proceedings Vol. 0394:
Optical Microlithography II: Technology for the 1980s
Harry L. Stover, Editor(s)

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