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Proceedings Paper

Overlay Performance Of The Perkin-Elmer Model 500
Author(s): C. P. Ausschnitt; T. A. Brunner; D. J. Cronin
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Paper Abstract

We describe the procedures and results of overlay performance evaluation conducted on production Micralign Series Model 500s. Studies of machine-to-contact print and machine-to-machine overlay, stability, and automatic alignment are presented. Preliminary results on automatic alignment indicate that the 98% limit of total overlay error - alignment plus distortion - can be kept below 0.3 μm.

Paper Details

Date Published: 7 November 1983
PDF: 9 pages
Proc. SPIE 0394, Optical Microlithography II: Technology for the 1980s, (7 November 1983);
Show Author Affiliations
C. P. Ausschnitt, The Perkin-Elmer Corporation (United States)
T. A. Brunner, The Perkin-Elmer Corporation (United States)
D. J. Cronin, The Perkin-Elmer Corporation (United States)

Published in SPIE Proceedings Vol. 0394:
Optical Microlithography II: Technology for the 1980s
Harry L. Stover, Editor(s)

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