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Proceedings Paper

Applications Of Focused Ion Beams
Author(s): Alfred Wagner
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Paper Abstract

A finely focused ion beam system is described. Beams of Ga, In, and Au ions emitted from a liquid metal ion source are routinely focused to spot diameters of ~0.1 to 3.0 μm at a current density of ~0.5 A/cm2 and a beam energy of 20 keV. Focused beams with energies of 1 to 30 keV have also been produced. Three applications are discussed: 1) scanning ion microscopy, 2) mask repair, and 3) ion beam lithography. Scanning ion images illustrating topographic and chemical contrast are presented. The repair of opaque and clear defects in optical masks, and opaque defects in X-ray masks is shown. Defects are imaged with the ion beam and removed by sputter erosion. Edge reconstruction of 0.5μm features is demonstrated. Most repairs take less than 10 sec per μm2. The advantages and limitations of ion beams for lithography are discussed.

Paper Details

Date Published: 7 November 1983
PDF: 10 pages
Proc. SPIE 0393, Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II, (7 November 1983); doi: 10.1117/12.935108
Show Author Affiliations
Alfred Wagner, Bell Laboratories (United States)

Published in SPIE Proceedings Vol. 0393:
Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II
Phillip D. Blais, Editor(s)

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