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Proceedings Paper

Normal Incidence Spectrophotometer Film Thickness Measurement Tool
Author(s): S. A. Manning
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Paper Abstract

The Normal Incidence Spectrophotometer (NIS) Measurement Tool is used to automatically measure the thickness of transparent films on silicon wafers. Under the control of an IBM. System 7 computer, both, wafer handling and the thickness measurement are performed. automatically. Wafers are transported through the tool on a covered airtrack, and after posi-tioning in a vacuum, chuck, are moved under the measurement head to pre-programmed measurement sites. Reflectivity data from the wafer surface, as a function of wavelength, is used by a software algorithm to calculate film, thickness. This tool is used on advanced manufacturing lines at IBM in both. East Fishkill, N.Y. and Burlington, Vt.

Paper Details

Date Published: 23 May 1983
PDF: 9 pages
Proc. SPIE 0360, Robotics and Industrial Inspection, (23 May 1983); doi: 10.1117/12.934107
Show Author Affiliations
S. A. Manning, IBM Corporation (United States)

Published in SPIE Proceedings Vol. 0360:
Robotics and Industrial Inspection
David P. Casasent, Editor(s)

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