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Proceedings Paper

Improving Registration In Photolithography
Author(s): H. R. Rottmann
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Paper Abstract

During the next five to ten years we can expect optical lithography to reach its limits, which may be defined as the printability of minimum feature sizes ranging from about 0.4 μm to 0.8 μm.

Paper Details

Date Published: 15 October 1982
PDF: 6 pages
Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); doi: 10.1117/12.933679
Show Author Affiliations
H. R. Rottmann, IBM General Technology Division (United States)

Published in SPIE Proceedings Vol. 0342:
Integrated Circuit Metrology I
Diana Nyyssonen, Editor(s)

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