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Proceedings Paper

Automatic Detection And Quantification Of Contaminants On Reticles For Semiconductor Microlithography
Author(s): George Quackenbos; Sergey Broude; Eric Chase
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Paper Abstract

While light scattering is widely used for particle detection, this technique has not been applied to automatic inspection of microlithographic reticle surfaces, because the periodic patterns on the surface behave as diffraction gratings producing signals which are hard to distinguish from those produced by particles. Automatic reticle inspection systems have been limited to complex pattern recognition schemes which require lengthy inspection times and a large data base of individual reticle patterns. Light scattering techniques yield simpler systems that have higher throughput and require no apriori knowledge of the reticle pattern. The instrument described in this paper employs a highly focused He-Ne laser beam to alternately scan the reticle surfaces, and signal processing to identify the size and location of contaminants on the surfaces of the reticle. From these data, a quantitative decision as to the reticle's acceptability can be rendered. A system that includes this instrument, along with the means for automatic reticle handling reduces contamination problems associated with manual intervention. This system is presently incorporated in GCA's 4800 DSW wafer stepper when configured with an automatic reticle changer (GCA's 5510 ARC).

Paper Details

Date Published: 15 October 1982
PDF: 9 pages
Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); doi: 10.1117/12.933677
Show Author Affiliations
George Quackenbos, GCA Corporation (United States)
Sergey Broude, GCA Corporation (United States)
Eric Chase, GCA Corporation (United States)

Published in SPIE Proceedings Vol. 0342:
Integrated Circuit Metrology I
Diana Nyyssonen, Editor(s)

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