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Proceedings Paper

Making Of Secondary Standards From National Bureau Of Standards (NBS) Photomask Standard
Author(s): ManLung Auyeung
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Paper Abstract

To minimize the risk of damaging expensive high quality linewidth standards, secondary standards can be made for use in a production environment. This paper discribes a simple method of estimating the total uncertainty of secondary standards. The method includes procedures for estimating random and systemetic errors of the linewidth measuring instrument used to characterize the secondary standards. Given the total uncertainty of the NBS SRM474 standard, the total uncertainty of the secondary standards may be estimated.

Paper Details

Date Published: 15 October 1982
PDF: 7 pages
Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); doi: 10.1117/12.933674
Show Author Affiliations
ManLung Auyeung, Siliconix Incorporated (United States)

Published in SPIE Proceedings Vol. 0342:
Integrated Circuit Metrology I
Diana Nyyssonen, Editor(s)

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