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Proceedings Paper

Photomask Iinewidth Measurement Correlation Techniques Using The Standard Reference Material (SRM) 474 National Bureau Of Standards (NBS) Linewidth Standard
Author(s): F. Caprari
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Paper Abstract

During 1980, the Photomask Technology Operations activity at the RCA Solid State Division at Somerville, N.J., initiated a program entitled "Metrology Techniques for Linewidth Measurements." The purpose of this program was to improve accuracy, precision, and correlation of linewidth measurements on photomasks. With the cooperation of the NBS (National Bureau of Standards) Dimensional Metrology Semiconductor Materials and Processes Division, this program reached an advanced state of development. Correlation tests between the video image-scanning system used by the RCA Photomask Technology Operations and an optical image-scanning system used by Qualitron, Danbury, CT. indicate the overall linewidth measurement error to be within ± 0.1 micrometer. This error includes the ± 0.05 micrometer uncertainty of the NBS SRM 474 standard. Routine production correlation linewidth measurements between the ITP Mark II and ITP Mark III Video Image-Scanning Systems show the uncertainty (systematic and random error) to be within ± 0.05 micrometers at an 87% acceptance level.

Paper Details

Date Published: 15 October 1982
PDF: 6 pages
Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); doi: 10.1117/12.933673
Show Author Affiliations
F. Caprari, RCA Solid State Division (United States)

Published in SPIE Proceedings Vol. 0342:
Integrated Circuit Metrology I
Diana Nyyssonen, Editor(s)

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