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Proceedings Paper

Linewidth Vernier (LWV)
Author(s): B. J. Lin
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Paper Abstract

Linewidth control is one of the most important requirements in integrated circuit fabrication. Usually, linewidth variations after each processing step are measured with a microscope containing an eyepiece in which a scale is engraved. The precision obtained by this method is very low. To achieve a high precision, electronic image processing of optical microscopic images offers fast, non-destructive, and repeatable readings. However, these tools are expensive. They require frequent calibration to ascertain consistency of the absolute reading. A correction increment has to be established and added to the apparent linewidth for each line thickness, the composition of layers, and microscope settings such as illumination coherence, focussing condition, numerical aperture, lens aberrations, and the intensity threshold selected to define the electronic linewidth.

Paper Details

Date Published: 13 September 1982
PDF: 4 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933584
Show Author Affiliations
B. J. Lin, IBM Thomas J. Watson Research Center (United States)

Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)

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