Proceedings Paper
Comparison Of Autoalign Techniques| Format | Member Price | Non-Member Price |
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Paper Abstract
Design criteria for wafer stepper alignment systems are discussed. Several examples are presented. A glossary of terms is included.
Paper Details
Date Published: 13 September 1982
PDF: 8 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933562
Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)
PDF: 8 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933562
Show Author Affiliations
Bruce Heflinger, GCA/Burlington (United States)
Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)
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