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Proceedings Paper

Spectral Exposure Meter
Author(s): Nathan Gold
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Paper Abstract

As microlithography progresses to smaller geometries, the tolerance available for exposure variation is rapidly diminishing. Due to this requirement, it is advantageous to set the exposure more accurately by using an exposure meter that has its spectral response matched to the photoresist spectral response. A new exposure meter has been developed that contains a complete UV spectrometer in a package the size of a 100mm wafer chuck. This meter can be adjusted to match the response of any photoresist over the wavelength range of 254 to 436 nanometers.

Paper Details

Date Published: 13 September 1982
PDF: 3 pages
Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); doi: 10.1117/12.933557
Show Author Affiliations
Nathan Gold, Nathan Gold & Associates (United States)

Published in SPIE Proceedings Vol. 0334:
Optical Microlithography I: Technology for the Mid-1980s
Harry L. Stover, Editor(s)

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