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Proceedings Paper

X-Ray Mask Fabrication
Author(s): Daniel L. Brors
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Paper Abstract

X-ray lithography is composed of three elements, the alignment machine with an X-ray source, X-ray photomasks, and X-ray resist. This paper describes the processes used to manufacture boron-nitride X-ray masks and some of the results using those masks.

Paper Details

Date Published: 30 June 1982
PDF: 2 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933420
Show Author Affiliations
Daniel L. Brors, Eaton Corporation (United States)

Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)

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