
Proceedings Paper
Shaped Beams For Integrated Circuit FabricationFormat | Member Price | Non-Member Price |
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Paper Abstract
Shaped E-Beam systems have superior writing speed for a given resolution requirement by virtue of their ability to expose numerous pattern elements in parallel. The added optic elements and circuitry for shaping makes the systems somewhat more complex than gaussian spot systems however, this is compensated by the lower circuit operating speeds and greater flexibility.
Paper Details
Date Published: 30 June 1982
PDF: 6 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933418
Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)
PDF: 6 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933418
Show Author Affiliations
Edward V. Weber, IBM Corporation (United States)
Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)
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