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Proceedings Paper

Sources For The Production And Spectral Control Of Deep Ultraviolet Radiation
Author(s): Jerry Bachur
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Paper Abstract

Multi-level resist technology is rapidly emerging as a technique capable of significantly improving processes needed to achieve desired yields on VLSI products. For the multi-level resist technology to be successful, production-rated Deep Ultraviolet (DUV) exposure systems will be required.

Paper Details

Date Published: 30 June 1982
PDF: 6 pages
Proc. SPIE 0333, Submicron Lithography I, (30 June 1982); doi: 10.1117/12.933411
Show Author Affiliations
Jerry Bachur, The Hybrid Technology Group, Inc. (United States)

Published in SPIE Proceedings Vol. 0333:
Submicron Lithography I
Phillip D. Blais, Editor(s)

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