Proceedings Paper
Use Of Laser Annealing To Achieve Low Loss In Corning 7059 Glass, ZnO, Si3N4, Nb2O5, And Ta2O5 Optical Thin Film Waveguides| Format | Member Price | Non-Member Price |
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Paper Abstract
We report consiaerabe success in using the technique of laser annealing to reduce scattering in a variety of thin-film optical waveguides deposited onto thermally-oxidized silicon substrates. For the materials Si 3N4, Nb90,, and Ta205 values of waveguide loss less than 1 oB/cm were achieved. Values of waveguide loss as1UW as'.01 db/cm nave been measured for laser-annealed Zn0 waveguides and for Corning 7059 glass wave-guides which have been both laser anneal ea and had surface coatings applied.
Paper Details
Date Published: 27 August 1982
PDF: 6 pages
Proc. SPIE 0321, Integrated Optics II, (27 August 1982); doi: 10.1117/12.933213
Published in SPIE Proceedings Vol. 0321:
Integrated Optics II
Dennis G. Hall, Editor(s)
PDF: 6 pages
Proc. SPIE 0321, Integrated Optics II, (27 August 1982); doi: 10.1117/12.933213
Show Author Affiliations
S. Dutta, University of Cincinnati (United States)
H. E. Jackson, University of Cincinnati (United States)
H. E. Jackson, University of Cincinnati (United States)
J. T. Boyd, University of Cincinnati (United States)
Published in SPIE Proceedings Vol. 0321:
Integrated Optics II
Dennis G. Hall, Editor(s)
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