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Proceedings Paper

Use Of Phase Measuring Interferometry For Surface Characterization
Author(s): Chungte W. Chen
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Paper Abstract

The Phase Measuring Interferometer (PMI) technique has been adapted to the measurement of small scale features of very high quality (low scatter) optical surfaces. The method described has good vertical and lateral resolution over a wide range of fields. It is non-contacting, applicable to various materials and coatings, and can be extended to spherical and aspherical surfaces. The compact PMI device can be modified to provide in-situ measurements on both small and very large optical surfaces. Data, including rms surface roughness and surface contour maps, are presented for several surfaces. The nature and effect of the principal error sources are also discussed.

Paper Details

Date Published: 24 March 1982
PDF: 7 pages
Proc. SPIE 0316, High Resolution Soft X-Ray Optics, (24 March 1982); doi: 10.1117/12.933118
Show Author Affiliations
Chungte W. Chen, Perkin-Elmer Corporation (United States)

Published in SPIE Proceedings Vol. 0316:
High Resolution Soft X-Ray Optics
Eberhard Adolf Spiller, Editor(s)

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