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Proceedings Paper

Chemical Vapor Deposition Of Silicon Carbide For Large Area Mirrors
Author(s): Richard L. Gentilman; Edward A. Maguire
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Paper Abstract

CVD-SiC has been identified as the leading mirror material for high energy synchrotron radiation because of its high K/a ratio and its ability to be super-polished to <10 A rms roughness. Technology already exists for depositing SiC over large areas (approximately 70 cm x 20 cm). The CVD process, substrate selection, and mirror design considerations are discussed.

Paper Details

Date Published: 3 May 1982
PDF: 4 pages
Proc. SPIE 0315, Reflecting Optics for Synchrotron Radiation, (3 May 1982); doi: 10.1117/12.932999
Show Author Affiliations
Richard L. Gentilman, Raytheon Company (United States)
Edward A. Maguire, Raytheon Company (United States)

Published in SPIE Proceedings Vol. 0315:
Reflecting Optics for Synchrotron Radiation
Malcolm R. Howells, Editor(s)

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