The use of computer-generated holograms (CGHs) to test aspheric surfaces fabricated by modern optical methods such as diamond-turned machining has become increasingly important. The making of CGHs may, however, be limited in spatial resolution and space-bandwidth product provided by commercial optical recording devices. We will demonstrate that CGHs of high spatial resolution and large space-bandwidth product can be written directly on electron-resist using e-beam lithography. This approach not only reduces plotti9g errors normally introduced by optical recording devices, but also provides more than 100 distor-tion-free resolution picture elements in a synthetic hologram of correct size. In this paper, we will discuss how to make such a synthetic hologram by means of e-beam lithography. The performance of this CGH will be demonstrated by comparing with a non-rotationally symmetric aspheric wavefront of over 100 waves of spherical aberration using a concave mirror and plane parallel plate combination as the test piece.

Date Published: 31 March 1982
PDF: 7 pages
Proc. SPIE 0306, Contemporary Methods of Optical Fabrication, (31 March 1982); doi: 10.1117/12.932745

Published in SPIE Proceedings Vol. 0306:
Contemporary Methods of Optical Fabrication
Charles L. Stonecypher, Editor(s)