The multipass reflectometer has been shown to be a convenient and precise instrument for the measurement of spectral reflectances in excess of 0.99. This report gives a brief sketch of the initial setup of the reflectometer, its operation, optimization of para-meters, and some limitations to the expected precision. The instrumental precision is set by the uncertainty in the computer fit of a straight line to the measured data. Systematic errors due to nonuniform photosurfaces and the effects of astigmatism have been minimized. We have used this reflectrometer to measure the absolute reflectance of evaporated aluminum films in the uv and visible regions. It has also been used to measure the low-level insertion losses of laser window materials for this same spectral region.

Date Published: 30 December 1981
PDF: 3 pages
Proc. SPIE 0288, Los Alamos Conf on Optics '81, (30 December 1981); doi: 10.1117/12.932074

Published in SPIE Proceedings Vol. 0288:
Los Alamos Conf on Optics '81
Donald H. Liebenberg, Editor(s)