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Proceedings Paper

Pellicle Protection Of Integrated Circuit (IC) Masks
Author(s): Ron Hershel
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Paper Abstract

The demand for higher yields in IC fabrication, economic pressure to realize the potential of projection aligners, the requirement of defect-free reticles for water steppers, and the need to reduce mask handling on the production line have generated. considerable interest in pellicle protection. of IC masks and reticles. In this paper, the mask protection problem is examined with emphasis given to the relevant optical requirements of pellicles for various projection. systems.

Paper Details

Date Published: 28 July 1981
PDF: 6 pages
Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); doi: 10.1117/12.931869
Show Author Affiliations
Ron Hershel, Hershel Consulting Inc. (United States)

Published in SPIE Proceedings Vol. 0275:
Semiconductor Microlithography VI
James W. Dey, Editor(s)

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