Proceedings Paper
Optical testing for meter size aspheric optics| Format | Member Price | Non-Member Price |
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Paper Abstract
Several meter size steep aspheric optics, with aspheric departure ranging from 100μm to 2mm, have been
successfully fabricated at the College of Optical Sciences at University of Arizona. Optical metrology systems have
been developed for measuring the optical surfaces efficiently and accurately. These systems include laser tracker
surface profiler, swing arm optical CMM with different type of sensors, slope measurements with SCOTS, the
Software Configurable Optical Test System (SCOTS) and interferometry with computer generated holograms. We
summarize the test methods and provide comparison of the relative strengths and weaknesses.
Paper Details
Date Published: 25 October 2012
PDF: 12 pages
Proc. SPIE 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI, 84660S (25 October 2012); doi: 10.1117/12.930513
Published in SPIE Proceedings Vol. 8466:
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
Michael T. Postek; Victoria A. Coleman; Ndubuisi G. Orji, Editor(s)
PDF: 12 pages
Proc. SPIE 8466, Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI, 84660S (25 October 2012); doi: 10.1117/12.930513
Show Author Affiliations
Peng Su, College of Optical Sciences, The Univ. of Arizona (United States)
Chang Jin Oh, College of Optical Sciences, The Univ. of Arizona (United States)
Chang Jin Oh, College of Optical Sciences, The Univ. of Arizona (United States)
Chunyu Zhao, College of Optical Sciences, The Univ. of Arizona (United States)
James H. Burge, College of Optical Sciences, The Univ. of Arizona (United States)
Steward Observatory, The Univ. of Arizona (United States)
James H. Burge, College of Optical Sciences, The Univ. of Arizona (United States)
Steward Observatory, The Univ. of Arizona (United States)
Published in SPIE Proceedings Vol. 8466:
Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI
Michael T. Postek; Victoria A. Coleman; Ndubuisi G. Orji, Editor(s)
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