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Proceedings Paper

Generation of Si3N4 layers for laser applications
Author(s): J. Landrock; M. Zeuner; M. Nestler; D. Rost; Marc Kelemen; Sascha Hilzensauer
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Paper Abstract

The opportunities of film deposition by means of microwave plasma using plasma enhanced chemical vapor deposition (PECVD) will be discussed and the necessary process equipment presented. The AK series of MicroSystems GmbH is a platform for processing single substrates and is suitable for a variety of high-end applications. One possible application, the generation of passivation layers in the production of edge emitting diode lasers, is presented and discussed. By means of this application, the advantages of microwave plasmas are highlighted.

Paper Details

Date Published: 11 October 2012
PDF: 6 pages
Proc. SPIE 8486, Current Developments in Lens Design and Optical Engineering XIII, 84860Y (11 October 2012); doi: 10.1117/12.930440
Show Author Affiliations
J. Landrock, MicroSystems GmbH (Germany)
M. Zeuner, MicroSystems GmbH (Germany)
M. Nestler, MicroSystems GmbH (Germany)
D. Rost, MicroSystems GmbH (Germany)
Marc Kelemen, m2k-Laser GmbH (Germany)
Sascha Hilzensauer, m2k-Laser GmbH (Germany)

Published in SPIE Proceedings Vol. 8486:
Current Developments in Lens Design and Optical Engineering XIII
R. Barry Johnson; Virendra N. Mahajan; Simon Thibault, Editor(s)

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