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Proceedings Paper

Negative refraction and superlensing in two-dimensional triangular lattice graded photonic crystals
Author(s): Meiling Liu; Maojin Yun; Feng Xia; Jian Liang
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Paper Abstract

Negative refraction attracted great interest and quickly became the subject of extensive worldwide research thanks to the many novel optical phenomena it can enable. One of the most exciting applications of negative refraction is the possibility of imaging with sub-wavelength resolution, which is often called superlensing. Recently, it has been shown that photonic crystals (PhCs) composed of synthetic periodic dielectric materials can exhibit an extraordinarily high nonlinear dispersion which causes effects such as negative refraction and self-focusing properties that are determined by the characteristics of their photonic band structures and equal frequency contours (EFCs). In this paper we have theoretically studied the negative refraction in two-dimensional (2D) triangular lattices graded photonic crystal (GPC) which constructed by varying the photonic crystal parameters so that its effective refractive index changes along the transverse direction of the slab. By using Plane Wave Expansion (PWE) method and Finite-Difference Time-Domain (FDTD) method we have studied the photonic band structure, equal frequency contours and the electric field distribution of the designed graded photonic crystal. Numerical simulations show that negative refraction and superlensing can be realized in the designed graded photonic crystal.

Paper Details

Date Published: 15 October 2012
PDF: 8 pages
Proc. SPIE 8497, Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications VI, 849717 (15 October 2012); doi: 10.1117/12.928562
Show Author Affiliations
Meiling Liu, Qingdao Univ. (China)
Maojin Yun, Qingdao Univ. (China)
Feng Xia, Qingdao Univ. (China)
Jian Liang, Qingdao Univ. (China)


Published in SPIE Proceedings Vol. 8497:
Photonic Fiber and Crystal Devices: Advances in Materials and Innovations in Device Applications VI
Shizhuo Yin; Ruyan Guo, Editor(s)

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