Share Email Print

Proceedings Paper

Chemically induced electric field: flat band potential engineering
Author(s): T. Bak; Z. Guo; W. Li; A.J. Atanacio; J. Nowotny
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

The present work considers engineering of the flat band potential, FBP, of metal oxides in a controlled manner. The aim is to minimise the energy losses related to recombination. The related experimental approaches include imposition of a chemically-induced electric field using the phenomena of segregation, diffusion and the formation of multilayer systems. This paper considers several basic phenomena that allow the modification of the surface charge and the space charge at the gas/solid and solid/liquid interfaces.

Paper Details

Date Published: 5 October 2012
PDF: 7 pages
Proc. SPIE 8469, Solar Hydrogen and Nanotechnology VII, 84690Q (5 October 2012); doi: 10.1117/12.927749
Show Author Affiliations
T. Bak, Univ. of Western Sydney (Australia)
Z. Guo, Univ. of Wollongong (Australia)
W. Li, Univ. of Western Sydney (Australia)
A.J. Atanacio, Univ. of Western Sydney (Australia)
Australian Nuclear Science and Technology Organisation (Australia)
J. Nowotny, Univ. of Western Sydney (Australia)

Published in SPIE Proceedings Vol. 8469:
Solar Hydrogen and Nanotechnology VII
Lionel Vayssieres, Editor(s)

© SPIE. Terms of Use
Back to Top