
Proceedings Paper
Uncertainties of displacement measurement of nanometrology coordinate measurement machines caused by laser source fluctuationsFormat | Member Price | Non-Member Price |
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Paper Abstract
One of considerable sources of displacement measurement uncertainty in nanometrology systems such as
multidimensional interferometric positioning for local probe microscopy is the influence of amplitude and especially
frequency noise of a laser source which powers the interferometers. We investigated the noise properties of several laser
sources suitable for interferometry for micro- and nano-CMMs (coordinate measurement machines) and compared the
results with the aim to find the best option. The influences of amplitude and frequency fluctuations were compared
together with the noise and uncertainty contributions of other components of the whole measuring system. Frequency
noise of investigated laser sources was measured by two approaches - at first with the help of frequency discriminator
(Fabry-Perot resonator) converting the frequency (phase) noise into amplitude one and then directly through the
measurement of displacement noise at the output of the interferometer fringe detection and position evaluation. Both
frequency noise measurements and amplitude noise measurements were done simultaneously through fast and high
dynamic range synchronous sampling to have the possibility to separate the frequency noise and to compare the recorded
results.
Paper Details
Date Published: 27 April 2012
PDF: 9 pages
Proc. SPIE 8430, Optical Micro- and Nanometrology IV, 84301D (27 April 2012); doi: 10.1117/12.922439
Published in SPIE Proceedings Vol. 8430:
Optical Micro- and Nanometrology IV
Christophe Gorecki; Anand K. Asundi; Wolfgang Osten, Editor(s)
PDF: 9 pages
Proc. SPIE 8430, Optical Micro- and Nanometrology IV, 84301D (27 April 2012); doi: 10.1117/12.922439
Show Author Affiliations
Jan Hrabina, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)
Josef Lazar, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)
Josef Lazar, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)
Ondrej Cip, Institute of Scientific Instruments of the ASCR, v.v.i. (Czech Republic)
Published in SPIE Proceedings Vol. 8430:
Optical Micro- and Nanometrology IV
Christophe Gorecki; Anand K. Asundi; Wolfgang Osten, Editor(s)
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