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Proceedings Paper

Bragg reflectors for large optical aperture MEMS Fabry-Perot interferometers
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Paper Abstract

This paper presents the fabrication of large-aperture low-pressure chemical-vapour deposited (LPCVD) Bragg reflectors utilizing low-stress polysilicon (PolySi) and silicon-rich silicon nitride (SiN) λ/4-thin film stacks. These structures can function as the upper mirror in a MEMS FPI device. High aspect-ratio mirror membranes were successfully released for 5 - 10 mm diameter range by sacrificial SiO2 etching in HF vapour. Optical simulations are presented for the Bragg reflector test structures designed for FPIs operating in the NIR range and the properties such as release yield and mechanical stability of the released LPCVD deposited polySi-SiN mirror membranes are compared with similar released atomic layer deposited (ALD) Al2O3-TiO2 λ/4-thin film mirror stacks. The realization of these Bragg reflector structures is the first step in the process integration of large-aperture MEMS FPI for miniature NIR imaging spectrometers, which can be applied to a variety of applications ranging from medical imaging and diagnostics to spaceand environmental monitoring instrumentation.

Paper Details

Date Published: 7 May 2012
PDF: 8 pages
Proc. SPIE 8373, Micro- and Nanotechnology Sensors, Systems, and Applications IV, 83732R (7 May 2012); doi: 10.1117/12.920578
Show Author Affiliations
Anna Rissanen, VTT Technical Research Ctr. of Finland (Finland)
Rami Mannila, VTT Technical Research Ctr. of Finland (Finland)
Jarkko Antila, VTT Technical Research Ctr. of Finland (Finland)

Published in SPIE Proceedings Vol. 8373:
Micro- and Nanotechnology Sensors, Systems, and Applications IV
Thomas George; M. Saif Islam; Achyut Dutta, Editor(s)

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