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Proceedings Paper

The saga of lambda: spectral influences throughout lithography generations
Author(s): Bruce W. Smith
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Paper Abstract

In this paper, the progression of optical lithography from a spectral (or wavelength) perspective is presented. The interdependencies between materials, sources, design challenges, and scaling are described relative the needs of semiconductor device generations. Comparisons of materials and approaches for use in the blue-UV, the mid-UV, the deep-UV, and to EUV wavelengths are provided showing the spectral influences for choices made. Inorganic and organic lithography materials, sources of radiation, and incremental wavelength "shrink" are compared for lithography generations from g-line to EUV and beyond.

Paper Details

Date Published: 20 March 2012
PDF: 9 pages
Proc. SPIE 8325, Advances in Resist Materials and Processing Technology XXIX, 83250Z (20 March 2012); doi: 10.1117/12.920025
Show Author Affiliations
Bruce W. Smith, Rochester Institute of Technology (United States)

Published in SPIE Proceedings Vol. 8325:
Advances in Resist Materials and Processing Technology XXIX
Mark H. Somervell; Thomas I. Wallow, Editor(s)

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