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Proceedings Paper

Imprint process performance for patterned media at densities greater than 1Tb/in2
Author(s): Zhengmao Ye; Scott Carden; Paul Hellebrekers; Dwayne LaBrake; Douglas J. Resnick; M. Melliar-Smith; S. V. Sreenivasan
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Paper Abstract

The use of bit pattern media beyond densities of 1Tb/in2 requires the ability to pattern dimensions to sub 10nm. This paper describes the techniques used to reach these dimensions with imprint lithography and avoid such challenges as pattern collapse, by developing improved resist materials with higher strength, and utilizing a reverse tone J-FIL/R process.

Paper Details

Date Published: 21 March 2012
PDF: 6 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230V (21 March 2012); doi: 10.1117/12.918042
Show Author Affiliations
Zhengmao Ye, Molecular Imprints, Inc. (United States)
Scott Carden, Molecular Imprints, Inc. (United States)
Paul Hellebrekers, Molecular Imprints, Inc. (United States)
Dwayne LaBrake, Molecular Imprints, Inc. (United States)
Douglas J. Resnick, Molecular Imprints, Inc. (United States)
M. Melliar-Smith, Molecular Imprints, Inc. (United States)
S. V. Sreenivasan, Molecular Imprints, Inc. (United States)

Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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