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Proceedings Paper

Line-end gap measurement with YieldStar scatterometer: towards an OPC model calibration
Author(s): A.-L. Charley; M. Dusa; T.-B. Chiou; P. Leray; S. Cheng; A. Fumar-Pici
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Paper Abstract

Line-end gap measurement for OPC calibration is a challenge for metrology. Even for CD-SEM, the rounded shape of the line end makes it very difficult to measure precisely. We have presented preliminary results of the application of scatterometry to these challenging structures using an angle resolved polarized scatterometer: ASML YieldStar [1]. In this paper, the exercise was extended to several different structures combining multiple line-end gap situations. Systematic comparison with CD-SEM is performed and discussed. Lithographic behavior of the main parameters is analyzed. Strengths and limits of the technique will be shown. Once validated, the metrology is used to build an OPC model and correct our test vehicle.

Paper Details

Date Published: 5 April 2012
PDF: 8 pages
Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83242I (5 April 2012); doi: 10.1117/12.918028
Show Author Affiliations
A.-L. Charley, IMEC (Belgium)
M. Dusa, ASML (Netherlands)
T.-B. Chiou, ASML (Netherlands)
P. Leray, IMEC (Belgium)
S. Cheng, IMEC (Belgium)
A. Fumar-Pici, ASML (Netherlands)

Published in SPIE Proceedings Vol. 8324:
Metrology, Inspection, and Process Control for Microlithography XXVI
Alexander Starikov, Editor(s)

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