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Proceedings Paper

Development of the reliable high power pulsed carbon dioxide laser system for LPP EUV light source
Author(s): Takeshi Ohta; Krzysztof M. Nowak; Takashi Suganuma; Hidenobu Kameda; Masato Moriya; Toshio Yokoduka; Yasufumi Kawasuji; Junichi Fujimoto; Hakaru Mizoguchi
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Paper Abstract

Laser Produced Plasma (LPP) Extreme Ultra Violet (EUV) light source is expected to be used for next generation lithography. To realize such performance for industrial use, the main driver laser is one of the key components. Our source uses a high power pulsed carbon dioxide (CO2) laser as a plasma driver. A master oscillator and a power amplifier (MOPA) system based on a new configuration of an RF-excited CO2 laser is the key to high efficiency. And multiline amplification of CO2 laser is efficient to increase the extraction efficiency in the case of short pulse amplification like this amplification. Numerical result shows the amplification enhancement as 1.3 times higher than the single line amplification. This report shows its initial performance. Multiline configuration is applied to the master oscillator and the efficiency of multiline amplification is verified in our experimental amplifier system. We have achieved 10% energy extraction improvement using 2 lines (P20+P22) as compared to single line (P20).

Paper Details

Date Published: 23 March 2012
PDF: 8 pages
Proc. SPIE 8322, Extreme Ultraviolet (EUV) Lithography III, 83222O (23 March 2012); doi: 10.1117/12.916586
Show Author Affiliations
Takeshi Ohta, Komatsu Ltd. (Japan)
Krzysztof M. Nowak, Komatsu Ltd. (Japan)
Takashi Suganuma, Komatsu Ltd. (Japan)
Hidenobu Kameda, Komatsu Ltd. (Japan)
Masato Moriya, Komatsu Ltd. (Japan)
Toshio Yokoduka, Komatsu Ltd. (Japan)
Yasufumi Kawasuji, Komatsu Ltd. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 8322:
Extreme Ultraviolet (EUV) Lithography III
Patrick P. Naulleau; Obert R. Wood II, Editor(s)

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