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Proceedings Paper

Automated S/TEM metrology on advanced semiconductor gate structures
Author(s): M. Strauss; J. Arjavac; D. N. Horspool; K. Nakahara; C. Deeb; C. Hobbs
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Paper Abstract

Alternate techniques for obatining metrology data from advanced semiconductor device structures may be required. Automated STEM-based dimensional metrology (CD-STEM) was developed for complex 3D geometries in read/write head metrology in teh hard disk drive industry. It has been widely adopted, and is the process of record for metrology. Fully automated S/TEM metrology on advanced semiconductor gate structures is viable, with good repeatability and robustness. Consistent automated throughput of 10 samples per hour was achieved. Automated sample preparation was developed with sufficient throughput and quality to support the automated CD-STEM.

Paper Details

Date Published: 3 April 2012
PDF: 12 pages
Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83240Z (3 April 2012); doi: 10.1117/12.916526
Show Author Affiliations
M. Strauss, FEI Co. (United States)
J. Arjavac, FEI Co. (United States)
D. N. Horspool, FEI Co. (United States)
K. Nakahara, FEI Co. (United States)
C. Deeb, Intel Corp. (United States)
C. Hobbs, SEMATECH (United States)


Published in SPIE Proceedings Vol. 8324:
Metrology, Inspection, and Process Control for Microlithography XXVI
Alexander Starikov, Editor(s)

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