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Proceedings Paper

Evaluation of a novel ultra small target technology supporting on-product overlay measurements
Author(s): Henk-Jan H. Smilde; Arie den Boef; Michael Kubis; Martin Jak; Mark van Schijndel; Andreas Fuchs; Maurits van der Schaar; Steffen Meyer; Stephen Morgan; Jon Wu; Vincent Tsai; Cathy Wang; Kaustuve Bhattacharyya; Kai-Hsiung Chen; Guo-Tsai Huang; Chih-Ming Ke; Jacky Huang
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Paper Abstract

Reducing the size of metrology targets is essential for in-die overlay metrology in advanced semiconductor manufacturing. In this paper, μ-diffraction-based overlay (μDBO) measurements with a YieldStar metrology tool are presented for target-sizes down to 10 × 10 μm2. The μDBO technology enables selection of only the diffraction efficiency information from the grating by efficiently separating it from product structure reflections. Therefore, μDBO targets -even when located adjacent to product environment- give excellent correlation with 40 × 160 μm2 reference targets. Although significantly smaller than standard scribe-line targets, they can achieve total-measurement-uncertainty values of below 0.5 nm on a wide range of product layers. This shows that the new μDBO technique allows for accurate metrology on ultra small in-die targets, while retaining the excellent TMU performance of diffraction-based overlay metrology.

Paper Details

Date Published: 3 April 2012
PDF: 8 pages
Proc. SPIE 8324, Metrology, Inspection, and Process Control for Microlithography XXVI, 83241A (3 April 2012); doi: 10.1117/12.916382
Show Author Affiliations
Henk-Jan H. Smilde, ASML Netherlands B.V. (Netherlands)
Arie den Boef, ASML Netherlands B.V. (Netherlands)
Michael Kubis, ASML Netherlands B.V. (Netherlands)
Martin Jak, ASML Netherlands B.V. (Netherlands)
Mark van Schijndel, ASML Netherlands B.V. (Netherlands)
Andreas Fuchs, ASML Netherlands B.V. (Netherlands)
Maurits van der Schaar, ASML Netherlands B.V. (Netherlands)
Steffen Meyer, ASML Netherlands B.V. (Netherlands)
Stephen Morgan, ASML Netherlands B.V. (Netherlands)
Jon Wu, ASML Netherlands B.V. (Netherlands)
Vincent Tsai, ASML Netherlands B.V. (Netherlands)
Cathy Wang, ASML Netherlands B.V. (Netherlands)
Kaustuve Bhattacharyya, ASML Netherlands B.V. (Netherlands)
Kai-Hsiung Chen, TSMC Ltd. (Taiwan)
Guo-Tsai Huang, TSMC Ltd. (Taiwan)
Chih-Ming Ke, TSMC Ltd. (Taiwan)
Jacky Huang, TSMC Ltd. (Taiwan)

Published in SPIE Proceedings Vol. 8324:
Metrology, Inspection, and Process Control for Microlithography XXVI
Alexander Starikov, Editor(s)

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