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Proceedings Paper

Block co-polymer guided self-assembly by surface chemical modification: optimization of multiple patterning process and pattern transfer
Author(s): Lorea Oria; Alaitz Ruiz de Luzuriaga; Juan A. Alduncín; Francesc Pérez-Murano
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Paper Abstract

Block co-polymer (BCP) lithography is becoming an established technique for patterning beyond optical lithography limitations. It is based on combining the intrinsic property of the block co-polymers to phase separate at the molecular scale with the capabilities of conventional top-down lithographic methods for patterning surfaces. Guiding the selfassembly of block co-polymers by surface chemical modification is one of the most used processes to drive the selfassembly in a convenient way. It consists on using lithography and oxygen plasma to create different wettability regions on a polymer brush grafted on the surface. For creating patterns with sub-22 nm resolution, this process introduces a tight restriction in the guiding lithography process. We present an easier guided self-assembly process by surface chemical modification that allows for a more relaxed guiding pattern specifications, providing a simpler route for the fabrication of nanometer scale structures.

Paper Details

Date Published: 21 March 2012
PDF: 7 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 832327 (21 March 2012); doi: 10.1117/12.916339
Show Author Affiliations
Lorea Oria, Ctr. Nacional de Microelectrónica (Spain)
Alaitz Ruiz de Luzuriaga, CIDETEC (Spain)
Juan A. Alduncín, CIDETEC (Spain)
Francesc Pérez-Murano, Ctr. Nacional de Microelectrónica (Spain)


Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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