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Proceedings Paper

A reliable higher power ArF laser with advanced functionality for immersion lithography
Author(s): Akihiko Kurosu; Masaki Nakano; Masanori Yashiro; Masaya Yoshino; Hiroaki Tsushima; Hiroyuki Masuda; Takahito Kumazaki; Shinichi Matsumoto; Kouji Kakizaki; Takashi Matsunaga; Shinji Okazaki; Junichi Fujimoto; Hakaru Mizoguchi
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Paper Abstract

193nm ArF eximer lasers are expected to continue to be the main solution in photolithography, since advanced lithography tecnologies such as Multiple patterning and Self-aligned double patterning (SADP) are being developed. In order to appliy these tecnologies to high-volume semiconductor manufactureing, the key is to contain chip manufactureing costs. Therefore, improvement on Reliability, Availability and Maintainability of ArF excimer lasers is important.[1] We works on improving productivity and reducing downtime of ArF exmer lasers, which leads to Reliability, Availability and Maintainability improvemnet. First in this paper, our focus drilling tecnique, which increases depth of focus (DoF) by spectral bandwidth tuning is introdueced. This focus drilling enables to increase DoF for isolated contact holes. and it not degrades the wafer stage speed.[2] Second, a technique which eables to reduce gas refill time to zero is introduced. This technique reduces downtime so Availavility is expected to improve. In this paper, we report these tecniques by using simulation resutls and partially experimental resutls provided by a semiconductor manufacturer.

Paper Details

Date Published: 13 March 2012
PDF: 14 pages
Proc. SPIE 8326, Optical Microlithography XXV, 83261F (13 March 2012); doi: 10.1117/12.916324
Show Author Affiliations
Akihiko Kurosu, Gigaphoton Inc. (Japan)
Masaki Nakano, Gigaphoton Inc. (Japan)
Masanori Yashiro, Gigaphoton Inc. (Japan)
Masaya Yoshino, Gigaphoton Inc. (Japan)
Hiroaki Tsushima, Gigaphoton Inc. (Japan)
Hiroyuki Masuda, Gigaphoton Inc. (Japan)
Takahito Kumazaki, Gigaphoton Inc. (Japan)
Shinichi Matsumoto, Gigaphoton Inc. (Japan)
Kouji Kakizaki, Gigaphoton Inc. (Japan)
Takashi Matsunaga, Gigaphoton Inc. (Japan)
Shinji Okazaki, Gigaphoton Inc. (Japan)
Junichi Fujimoto, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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