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Proceedings Paper

A solid immersion interference lithography system for imaging ultra-high numerical apertures with high-aspect ratios in photoresist using resonant enhancement from effective gain media
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Paper Abstract

In the last year our Solid Immersion Lloyd's Mirror Interference Lithography (SILMIL) system has proved to be a successful tool for evanescent interferometric lithography (EIL). The initial goal was to use SILMIL in conjunction with the surface plasmon polariton (SPP) surface states at the resist-metal interface. Through this resonance, we aimed to counter the decay of evanescent images created using EIL. By analyzing the theory in greater detail we were able to develop a better understanding of the resonance phenomena. In this paper, details of the design of SILMIL and how one may utilize it to produce ultra-high numerical apertures (NAs) are given, as well as an introduction to the resonance phenomena and the mechanism behind it. We introduce a new method that requires a gain medium (one that has a negative loss) to achieve significant enhancements, and present an effective gain medium by using a high-index dielectric on low-index media. We present results at λ = 405 nm using such an effective gain medium and also provide a feasible design example at the lithography standard λ = 193 nm.

Paper Details

Date Published: 13 March 2012
PDF: 15 pages
Proc. SPIE 8326, Optical Microlithography XXV, 83260Z (13 March 2012); doi: 10.1117/12.916295
Show Author Affiliations
Prateek Mehrotra, Univ. of Canterbury (New Zealand)
Chris A. Mack, The Univ. of Texas at Austin (United States)
Richard J. Blaikie, Univ. of Canterbury (New Zealand)

Published in SPIE Proceedings Vol. 8326:
Optical Microlithography XXV
Will Conley, Editor(s)

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