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Proceedings Paper

Deformations of soft imprint templates in the nanoimprint lithography
Author(s): Jian He; S. Howitz; S. Killge; K. Richter; J. W. Bartha
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Paper Abstract

Soft imprint templates trend to deformation when imprint forces are added. This deformation occurs both in the macro aspect (unevenness of the imprint resist layer through the whole imprint area) and in the micro aspect (deformation of single structure). These deformations will be transferred directly to the imprint resist after its curing and thus influence the imprint results. An understanding of these deformation behaviors depending on the template geometry and the imprint process parameters is necessary for the process development. In this work the deformation behaviors of the polymer soft imprint template was analyzed using finite element method (FEM) and experimentally investigated.

Paper Details

Date Published: 21 March 2012
PDF: 7 pages
Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83231B (21 March 2012); doi: 10.1117/12.916287
Show Author Affiliations
Jian He, GeSiM Gesellschaft fuer Silizium-Mikrosysteme mbH (Germany)
Technische Univ. Dresden (Germany)
S. Howitz, GeSiM Gesellschaft fuer Silizium-Mikrosysteme mbH (Germany)
S. Killge, Technische Univ. Dresden (Germany)
K. Richter, Technische Univ. Dresden (Germany)
J. W. Bartha, Technische Univ. Dresden (Germany)

Published in SPIE Proceedings Vol. 8323:
Alternative Lithographic Technologies IV
William M. Tong, Editor(s)

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