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Proceedings Paper

Fabrication and characterization of Si/SiO2 high contrast grating using nanoimprint lithography
Author(s): Yuuki Hashizume; Yasumitsu Miyake; Akihiro Matsutani; Hideo Ohtsuki; Fumio Koyama
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Paper Abstract

Nanoimprint lithography is a powerful tool for making large area sub-wavelength scale optical devices with high-throughput fabrication. We developed a thermal nanoimprint lithography process for making sub-wavelength HCG patterns on an SOI substrate. A vertical etching profile and a smooth etched surface, which meet the requirements for Si based HCG structure, were obtained. We fabricated large area (1cm x 1cm) HCG with good uniformity in the entire sample. The clear angular dependence of the reflectivity of Si-HCG can be seen, which is in good agreement with the modeling result. The engineered angular dependence of HCG could be useful for the mode control of VCSELs and spatial mode multiplexers.

Paper Details

Date Published: 23 February 2012
PDF: 6 pages
Proc. SPIE 8270, High Contrast Metastructures, 827008 (23 February 2012); doi: 10.1117/12.910865
Show Author Affiliations
Yuuki Hashizume, Tokyo Institute of Technology (Japan)
Yasumitsu Miyake, Tokyo Institute of Technology (Japan)
Akihiro Matsutani, Tokyo Institute of Technology (Japan)
Hideo Ohtsuki, SAMCO, Inc. (Japan)
Fumio Koyama, Tokyo Institute of Technology (Japan)

Published in SPIE Proceedings Vol. 8270:
High Contrast Metastructures
Connie J. Chang-Hasnain; Fumio Koyama; Alan Eli Willner; Weimin Zhou, Editor(s)

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