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Proceedings Paper

Ultrafast diffractive optical micro-trap arrays for neutral atom quantum computing
Author(s): S. A. Kemme; G. R. Brady; A. R. Ellis; J. R. Wendt; D. W. Peters; G. W. Biedermann; T. R. Carter; S. Samora; J. A. Isaacs; V. V. Ivanov; M. Saffman
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Paper Abstract

We design and fabricate arrays of diffractive optical elements (DOEs) to realize neutral atom micro-traps for quantum computing. We initialize a single atom at each site of an array of optical tweezer traps for a customized spatial configuration. Each optical trapping volume is tailored to ensure only one or zero trapped atoms. Specifically designed DOEs can define an arbitrary optical trap array for initialization and improve collection efficiency in readout by introducing high-numerical aperture, low-profile optical elements into the vacuum environment. We will discuss design and fabrication details of ultra-fast collection DOEs integrated monolithically and coaxially with tailored DOEs that establish an optical array of micro-traps through far-field propagation. DOEs, as mode converters, modify the lateral field at the front focal plane of an optical assembly and transform it to the desired field pattern at the back focal plane of the optical assembly. We manipulate the light employing coherent or incoherent addition with judicious placement of phase and amplitude at the lens plane. This is realized through a series of patterning, etching, and depositing material on the lens substrate. The trap diameter, when this far-field propagation approach is employed, goes as 2.44λF/#, where the F/# is the focal length divided by the diameter of the lens aperture. The 8-level collection lens elements in this presentation are, to our knowledge, the fastest diffractive elements realized; ranging from F/1 down to F/0.025.

Paper Details

Date Published: 8 February 2012
PDF: 8 pages
Proc. SPIE 8249, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V, 82490E (8 February 2012); doi: 10.1117/12.910829
Show Author Affiliations
S. A. Kemme, Sandia National Labs. (United States)
G. R. Brady, Sandia National Labs. (United States)
A. R. Ellis, Sandia National Labs. (United States)
J. R. Wendt, Sandia National Labs. (United States)
D. W. Peters, Sandia National Labs. (United States)
G. W. Biedermann, Sandia National Labs. (United States)
T. R. Carter, Sandia National Labs. (United States)
S. Samora, Sandia National Labs. (United States)
J. A. Isaacs, Univ. of Wisconsin-Madison (United States)
V. V. Ivanov, Univ. of Wisconsin-Madison (United States)
M. Saffman, Univ. of Wisconsin-Madison (United States)

Published in SPIE Proceedings Vol. 8249:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V
Winston V. Schoenfeld; Raymond C. Rumpf; Georg von Freymann, Editor(s)

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