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Atomic layer deposition for fabrication of ytterbium doped fibers
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Paper Abstract

Atomic layer deposition (ALD) was used to fabricate an ytterbium (Yb)-doped silica fiber in combination with the conventional modified chemical vapor deposition (MCVD) method. An MCVD soot-preform with a porous layer of SiO2 doped with GeO2 was coated with layers of Yb2O3 and Al2O3 prior to sintering, using the ALD method. ALD is a surface controlled CVD-type process enabling thin film deposition over large substrates with good thickness control, uniformity and high conformality. A materials analysis study showed that the dopants successfully penetrated the full thickness of 320 μm of the soot layer. Preliminary preform and fiber experiments on refractive index profiles, background losses, lifetime and the characteristic gain-loss curve were performed demonstrating the potential of this method for fabricating Yb-doped fibers with high concentration of dopants.

Paper Details

Date Published: 15 February 2012
PDF: 7 pages
Proc. SPIE 8237, Fiber Lasers IX: Technology, Systems, and Applications, 82372B (15 February 2012); doi: 10.1117/12.908725
Show Author Affiliations
Joan J. Montiel i Ponsoda, Aalto Univ. School of Engineering (Finland)
Lars Norin, Acreo Fiber Lab. (Sweden)
Markus Bosund, Beneq Oy (Finland)
Changgeng Ye, Aalto Univ. School of Engineering (Finland)
Mikko J. Söderlund, Beneq Oy (Finland)
Ari Tervonen, Aalto Univ. School of Engineering (Finland)
Seppo Honkanen, Aalto Univ. School of Engineering (Finland)
Univ. of Eastern Finland (Finland)

Published in SPIE Proceedings Vol. 8237:
Fiber Lasers IX: Technology, Systems, and Applications
Eric C. Honea; Sami T. Hendow, Editor(s)

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