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Proceedings Paper

Soft lithography fabricated polymer waveguides and 45-degree inclined mirrors for card-to-backplane optical interconnects
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Paper Abstract

Polymer waveguides with 45° mirrors are fabricated by vacuum assisted microfluidic (VAM) soft lithographic technique for card-to-backplane optical interconnect applications. Waveguide array structures with inclined surfaces in SU-8 photoresist for PDMS mold are fabricated by prism assisted UV exposure. Sample surface reflected UV light is utilized to eliminate undercut structures and to accomplish the inclined mirror surfaces on both ends of the straight waveguide segments by one-step UV exposure. Polymer waveguides with 45° embedded mirrors demonstrated about 0.49 dB/cm propagation loss and 67% mirror coupling efficiency.

Paper Details

Date Published: 2 February 2012
PDF: 7 pages
Proc. SPIE 8267, Optoelectronic Interconnects XII, 82670R (2 February 2012); doi: 10.1117/12.908243
Show Author Affiliations
Guomin Jiang, Univ. of Miami (United States)
Sarfaraz Baig, Univ. of Miami (United States)
Michael R. Wang, Univ. of Miami (United States)

Published in SPIE Proceedings Vol. 8267:
Optoelectronic Interconnects XII
Alexei L. Glebov; Ray T. Chen, Editor(s)

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