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Proceedings Paper

Novel multiview generation framework for 3D displays
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Paper Abstract

In this paper, we propose a novel multi-view generation framework that considers the spatiotemporal consistency of each synthesized multi-view. Rather than independently filling in the holes of individual generated images, the proposed framework gathers hole information from each synthesized multi-view image to a reference viewpoint. The method then constructs a hole map and a SVRL (single view reference layer) at the reference viewpoint before restoring the holes in the SVRL, thereby generating a spatiotemporally consistent view. A hole map is constructed using depth information of the reference viewpoint and the input/output baseline length ratio. Thus, the holes in the SVRL can also represent holes in other multi-view images. To achieve temporally consistent hole filling in the SVRL, the restoration of holes in the current SVRL is performed by propagating the pixel value of the previous SVRL. Further hole filling is performed using a depth- and exemplar-based inpainting method. The experimental results showed that the proposed method generates high-quality spatiotemporally consistent multi-view images in various input/output environments. In addition, the proposed framework decreases the complexity of the hole-filling process by reducing repeated hole filling.

Paper Details

Date Published: 2 March 2012
PDF: 10 pages
Proc. SPIE 8288, Stereoscopic Displays and Applications XXIII, 828821 (2 March 2012); doi: 10.1117/12.907663
Show Author Affiliations
Kyuyoung Hwang, Samsung Advanced Institute of Technology (Korea, Republic of)
Yangho Cho, Samsung Advanced Institute of Technology (Korea, Republic of)
Hoyoung Lee, Samsung Advanced Institute of Technology (Korea, Republic of)
Dusik Park, Samsung Advanced Institute of Technology (Korea, Republic of)
Changyeong Kim, Samsung Advanced Institute of Technology (Korea, Republic of)

Published in SPIE Proceedings Vol. 8288:
Stereoscopic Displays and Applications XXIII
Andrew J. Woods; Nicolas S. Holliman; Gregg E. Favalora, Editor(s)

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