Share Email Print
cover

Proceedings Paper

Flat-field EUV spectrometer and its performance test by Penning discharge source
Author(s): Xuewei Du; Yuejiang Shi; Wei Zhang; Yongcai Shen; Qiuping Wang
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A high-resolution extreme ultraviolet (EUV) spectrometer is developed to diagnose the magnetically confined plasmas in the spectral region of 5-50 nm. The spectrometer consists a holographic aberration-corrected concave grating, an entrance slit, an x-ray shutter and a deep-cooled back-illuminated CCD camera. This paper presents the spectrometer structure, the spectral resolution simulation. The spectrometer is tested by a Penning discharge light source which is a convenient wavelength calibration source working at EUV spectral range. This light source emits a number of standard spectral lines with different combinations of discharge gas and cathode material, which will provide different standard spectral lines for wavelength calibration and spectral resolution evaluation. Results show that the spectral resolution is about 0.015 nm at 20 nm which agrees with the design goal.

Paper Details

Date Published: 5 December 2011
PDF: 5 pages
Proc. SPIE 8197, 2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments, 81971A (5 December 2011); doi: 10.1117/12.906583
Show Author Affiliations
Xuewei Du, Univ. of Science and Technology of China (China)
Yuejiang Shi, Institute of Plasma Physics (China)
Wei Zhang, Institute of Plasma Physics (China)
Yongcai Shen, Institute of Plasma Physics (China)
Qiuping Wang, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 8197:
2011 International Conference on Optical Instruments and Technology: Optical Systems and Modern Optoelectronic Instruments
Yongtian Wang; Yunlong Sheng; Han-Ping Shieh; Kimio Tatsuno, Editor(s)

© SPIE. Terms of Use
Back to Top