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Proceedings Paper

LED induced chlorophyll fluorescence signatures from leaves of Saccharum officinarum seedlings under water deficit stress
Author(s): Artur S. Gouveia-Neto; Elias A. Silva Jr.; Ronaldo A. Oliveira; Patrícia C. Cunha; Ernande B. Costa; Terezinha J. R. Câmara; Lilia G. Willadino
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Paper Abstract

LED-induced chlorophyll fluorescence spectral signatures from Saccharum officinarum leaves are employed to evaluate the effect of water deficit upon the plant growing process. The chlorophyll fluorescence spectral analysis is a nondestructive and nonintrusive indicator of the chlorophyll content of leaves and abiotic stress intensity, and is used to monitor the time evolution of the effect of water deficit stress upon plants physiological state. Red and far-red emission signals around 685 nm and 735 nm, respectively, are observed and examined as a function of irrigation amount. The intensity ratio of the fluorescence emissions allow one to detect signs of damage in the early stages of the plants growing process, and before traces of visible stress became apparent. The results indicated an unusual behavior of the fluorescence ratio for water stress that can potentially be used as a discriminator amongst several abiotic stresses.

Paper Details

Date Published: 9 February 2012
PDF: 7 pages
Proc. SPIE 8225, Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues X, 82251P (9 February 2012); doi: 10.1117/12.904921
Show Author Affiliations
Artur S. Gouveia-Neto, Univ. Federal Rural de Pernambuco (Brazil)
Elias A. Silva Jr., Univ. Federal Rural de Pernambuco (Brazil)
Ronaldo A. Oliveira, Univ. Federal Rural de Pernambuco (Brazil)
Patrícia C. Cunha, Univ. Federal Rural de Pernambuco (Brazil)
Ernande B. Costa, Univ. Federal Rural de Pernambuco (Brazil)
Terezinha J. R. Câmara, Univ. Federal Rural de Pernambuco (Brazil)
Lilia G. Willadino, Univ. Federal Rural de Pernambuco (Brazil)


Published in SPIE Proceedings Vol. 8225:
Imaging, Manipulation, and Analysis of Biomolecules, Cells, and Tissues X
Daniel L. Farkas; Dan V. Nicolau; Robert C. Leif, Editor(s)

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