
Proceedings Paper
Impact of the pattern layout on the performance of photonic crystal Fano broadband reflectorsFormat | Member Price | Non-Member Price |
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Paper Abstract
We report the impact of the pattern layout on the performance of Fano broadband reflectors based on 2D photonic
crystals (PCs) on silicon-on-insulator. Two representative PC patterns including hexagonal and square are fairly
compared with same buried oxide (BOX) layer thickness and equivalent refractive index of silicon layer by using 3D
FDTD technique. Both red- and blue- spectral shifts are demonstrated with either addition of oxide on top, and/or
selective etching of the BOX below. The hexagonal pattern can offer larger bandwidth with a bit lower reflectance as
compared to square one. Additionally, it is more sensitive to etching thickness.
Paper Details
Date Published: 5 December 2011
PDF: 8 pages
Proc. SPIE 8198, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration, 819806 (5 December 2011); doi: 10.1117/12.903954
Published in SPIE Proceedings Vol. 8198:
2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration
Xuping Zhang; P. K. Alex Wai; Hai Ming, Editor(s)
PDF: 8 pages
Proc. SPIE 8198, 2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration, 819806 (5 December 2011); doi: 10.1117/12.903954
Show Author Affiliations
Zhiyong Chen, Fujian Normal Univ. (China)
Zexuan Qiang, Fujian Normal Univ. (China)
Xiaofu Xu, Fujian Normal Univ. (China)
Zexuan Qiang, Fujian Normal Univ. (China)
Xiaofu Xu, Fujian Normal Univ. (China)
Junzhen Jiang, Fujian Normal Univ. (China)
Xiyao Chen, Minjiang Univ. (China)
Yishen Qiu, Fujian Normal Univ. (China)
Xiyao Chen, Minjiang Univ. (China)
Yishen Qiu, Fujian Normal Univ. (China)
Published in SPIE Proceedings Vol. 8198:
2011 International Conference on Optical Instruments and Technology: Optoelectronic Devices and Integration
Xuping Zhang; P. K. Alex Wai; Hai Ming, Editor(s)
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