
Proceedings Paper
Design and fabrication of sub-wavelength metal polarization gratings used in polarization imagingFormat | Member Price | Non-Member Price |
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Paper Abstract
This paper designs a sub-wavelength metal polarization gratings array composing two orthogonal micro polarization
gratings as one unit. Effects of different metal materials and grating profile on the TM and TE polarization transmittance
as well as the extinction ratio are analyzed by the Finite Difference Time Domain (FDTD) method. Based on the
requirement of the visible light polarization imaging and the resolution of the holographic lithography, we obtain the best
parameters for the grating: period is 250nm, Al thickness is 260nm, and duty cycle is 0.4, the transmittance is higher than
45% and extinction ratio is higher than 100. Then, the sub-wavelength metal polarization gratings have been fabricated
by two methods: the holographic - ion beam etching - Al oblique deposition or the holographic - reactive ion etch (RIE) -
ion beam etching. Preliminary results indicate the polarization information has been obtained. A prototype metal
polarization gratings array will be fabricated in late 2011.
Paper Details
Date Published: 8 December 2011
PDF: 7 pages
Proc. SPIE 8002, MIPPR 2011: Multispectral Image Acquisition, Processing, and Analysis, 80020F (8 December 2011); doi: 10.1117/12.902747
Published in SPIE Proceedings Vol. 8002:
MIPPR 2011: Multispectral Image Acquisition, Processing, and Analysis
Faxiong Zhang; Faxiong Zhang, Editor(s)
PDF: 7 pages
Proc. SPIE 8002, MIPPR 2011: Multispectral Image Acquisition, Processing, and Analysis, 80020F (8 December 2011); doi: 10.1117/12.902747
Show Author Affiliations
Peng Sun, Soochow Univ. (China)
Minghui Chen, Soochow Univ. (China)
Minghui Chen, Soochow Univ. (China)
Published in SPIE Proceedings Vol. 8002:
MIPPR 2011: Multispectral Image Acquisition, Processing, and Analysis
Faxiong Zhang; Faxiong Zhang, Editor(s)
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