
Proceedings Paper
Polymeric nanostructures fabricated by dynamic nanoinscribing technique and its applicationsFormat | Member Price | Non-Member Price |
---|---|---|
$17.00 | $21.00 |
Paper Abstract
Nanoscale grating structure can be utilized in many practical applications in optics, flat-panel displays, and
biosensors. Dynamic nanoinscribing (DNI) technique was newly developed to create large-area and truly continuous
nanograting patterns in a variety of metal or polymer materials with feature size down to sub-50 nm and at very high
speed. In this paper we investigate the nanopatterning of PC and SU-8 by DNI process and then take advantage of its
superior optical and thermal properties to explore its applications in nanooptics and nanofluidics. To carry out
nanoinscribing, silicon grating templates with different periods were first fabricated. The inscribing property of PC and
SU-8 under various pressures and temperatures was systematically studied, in which the experimental results were
compared with the simulation results described by a modified equation of Squeezed flow. Inscribed polymeric gratings
with period of 700nm were achieved and excellent uniformity can now be routinely replicated using this optimized
process. Using this technique, free-standing subwavelenth gratings based on SU-8 are successfully fabricated and their
performance are characterized. The inscribed polymeric gratings could also be sealed with another bare layer thermally
to serve as enclosed channels after oxygen plasma treatment. The fabricated nanofluidic channels were characterized
using spontaneous capillary filling with dyed water, demonstrating good quality of sealing.
Paper Details
Date Published: 8 September 2011
PDF: 7 pages
Proc. SPIE 8191, International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, 81912D (8 September 2011); doi: 10.1117/12.902409
Published in SPIE Proceedings Vol. 8191:
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies
Yuelin Wang; Huikai Xie; Yufeng Jin, Editor(s)
PDF: 7 pages
Proc. SPIE 8191, International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies, 81912D (8 September 2011); doi: 10.1117/12.902409
Show Author Affiliations
Liangjin Ge, Univ. of Science and Technology (China)
Xudi Wang, Hefei Univ. of Technology (China)
Qisheng Tang, Hefei Univ. of Technology (China)
Xudi Wang, Hefei Univ. of Technology (China)
Qisheng Tang, Hefei Univ. of Technology (China)
Jian Jin, Hefei Univ. of Technology (China)
Li Xin, Hefei Univ. of Technology (China)
Shaojun Fu, Univ. of Science and Technology (China)
Li Xin, Hefei Univ. of Technology (China)
Shaojun Fu, Univ. of Science and Technology (China)
Published in SPIE Proceedings Vol. 8191:
International Symposium on Photoelectronic Detection and Imaging 2011: Sensor and Micromachined Optical Device Technologies
Yuelin Wang; Huikai Xie; Yufeng Jin, Editor(s)
© SPIE. Terms of Use
