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Proceedings Paper

Productivity of femtosecond DUV laser photomask repair in a real world mask house
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Paper Abstract

A number of new technologies and processes have been developed for deep ultraviolet (DUV) wavelength and femtosecond pulsed laser repair of photomasks. These advances have been shown to improve and extend the repair of both pelliclized and non-pellicilized photomasks for both hard and soft (or nano-particle) in exhaustive testing at the factory and the end-user site. However, even the best testing is only a simulation of what a repair tool will see when brought into full production. The purpose of this work is to review some of the knowledge and experience gained in bringing the repair processes defined with manufactured defects to the more variable defects encountered in the real world. The impact of the repair technology on increases in mask house throughput and decrease in costs will also be compared to other (another laser and an advanced FIB) repair tools.

Paper Details

Date Published: 13 October 2011
PDF: 13 pages
Proc. SPIE 8166, Photomask Technology 2011, 81662X (13 October 2011); doi: 10.1117/12.898502
Show Author Affiliations
Jin-Hong Lin, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
C. Y. Chen, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
F. G. Tsai, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Tod Robinson, RAVE LLC (United States)
Daniel Yi, RAVE LLC (United States)
Jeff LeClaire, RAVE LLC (United States)
Roy White, RAVE LLC (United States)
Ron Bozak, RAVE LLC (United States)
Mike Archuletta, RAVE LLC (United States)

Published in SPIE Proceedings Vol. 8166:
Photomask Technology 2011
Wilhelm Maurer; Frank E. Abboud, Editor(s)

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