Proceedings Paper
Mask 3D effects: impact on imaging and placement| Format | Member Price | Non-Member Price |
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Paper Abstract
In this paper we perform a fundamental study on the impact of mask absorber in ArF immersions
lithography: the mask 3D effects. From simulations and analysis of diffraction coefficients we could
identify a range of relevant features and imaging and placement phenomena. For these features,
experimental results were obtained to pinpoint the mask 3D effects. We will demonstrate how to
model and understand the mask 3D effects and give solutions to counteract the mask 3D effects.
Paper Details
Date Published: 1 April 2011
PDF: 23 pages
Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850I (1 April 2011); doi: 10.1117/12.896909
Published in SPIE Proceedings Vol. 7985:
27th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)
PDF: 23 pages
Proc. SPIE 7985, 27th European Mask and Lithography Conference, 79850I (1 April 2011); doi: 10.1117/12.896909
Show Author Affiliations
Jo Finders, ASML Netherlands B.V. (Netherlands)
Thijs Hollink, ASML Netherlands B.V. (Netherlands)
Published in SPIE Proceedings Vol. 7985:
27th European Mask and Lithography Conference
Uwe F.W. Behringer, Editor(s)
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